XML Schema "procedure.xsd"
Target Namespace:
Version:
1.0
Defined Components:
elements (3 global + 9 local), complexTypes (6)
Default Namespace-Qualified Form:
Local Elements: qualified; Local Attributes: unqualified
Schema Location:
http://schemas.wmo.int/metce/1.0/procedure.xsd; see XML source
Imports Schemas (3):
Includes Schemas (1):
Included in Schemas (1):
Annotation
Annotation 1 [src]:
References to WMO and ICAO Technical Regulations within this XML schema shall have no formal status and are for information purposes only. Where there are differences between the Technical Regulations and the schema, the Technical Regulations shall take precedence. Technical Regulations may impose requirements that are not described in this schema.
Annotation 2 [src]:
The 'Procedure' package provides a concrete implementation of the abstract OM_Process class (from ISO 19156). The implementation is intended to support the following requirements: 1) reference to supporting documentation (attribute "documentationRef"); e.g. online documentation describing the procedure in detail; 2) specification of parameters that remain fixed within a particular configuration of the procedure (Configuration); a soft-typed approach is used here following the pattern adopted for OM_Observation/parameter; 3) specification of the resolution [1] with which each observed physical phenomenon is measured; and 4) specification of the measuring interval [2] of the instrument or sensor for each observed physical phenomenon. [1] Resolution: smallest change in a quantity being measured that causes a perceptible change in the corresponding indication (from the 'International vocabulary of metrology' [http://www.bipm.org/utils/common/documents/jcgm/JCGM_200_2008.pdf]) [2] Measuring interval: set of values of quantities of the same kind that can be measured by a given measuring instrument or measuring system with specified instrumental uncertainty, under defined conditions (from the 'International vocabulary of metrology' [http://www.bipm.org/utils/common/documents/jcgm/JCGM_200_2008.pdf])
All Element Summary
The association role 'context' references an instance of MeasurementContext class that defines resolution and measuring interval for a specific measurand.
Type:
Content:
complex, 10 attributes, 1 element
Defined:
locally within metce:ProcessType complexType; see XML source
Reference to an external process definition providing information about relevant documentation that describes the associated Process.
Type:
Content:
empty, 10 attributes
Defined:
locally within metce:ProcessType complexType; see XML source
The attribute 'measurand' [1] specifies the physical property that the associated 'resolution' and 'measuring interval' apply to.
Type:
Content:
complex, 10 attributes, 1 element
Defined:
Instances of the class 'MeasurementContext' specify the resolution [1] and measuring interval [2] for a given physical property in the context of this measurement procedure. [1] Resolution: smallest change in a quantity being measured that causes a perceptible change in the corresponding indication (from the 'International vocabulary of metrology' [http://www.bipm.org/utils/common/documents/jcgm/JCGM_200_2008.pdf]) [2] Measuring interval: set of values of quantities of the same kind that can be measured by a given measuring instrument or measuring system with specified instrumental uncertainty, under defined conditions (from the 'International vocabulary of metrology' [http://www.bipm.org/utils/common/documents/jcgm/JCGM_200_2008.pdf])
Type:
Content:
complex, 1 attribute, 9 elements
Subst.Gr:
may substitute for elements: gml:AbstractGML, gml:AbstractObject
Defined:
globally; see XML source
Used:
The attribute 'measuringInterval' [1] specifies the extreme lower and upper limits of property values of the 'measurand' that can measured within this procedure, using the unit of measure 'uom'. [1] Measuring interval: set of values of quantities of the same kind that can be measured by a given measuring instrument or measuring system with specified instrumental uncertainty, under defined conditions (from the 'International vocabulary of metrology' [http://www.bipm.org/utils/common/documents/jcgm/JCGM_200_2008.pdf])
Type:
Content:
complex, 1 attribute, 1 element
Defined:
The association role 'parameter' references an instance of NamedValue that specifies parameters associated with a particular configuration of the procedure (Configuration)
Type:
Content:
complex, 9 attributes, 1 element
Defined:
locally within metce:ProcessType complexType; see XML source
Class 'OM_Process' (related to OM_Observation via the 'Procedure' Association) is used to define the process(es) involved in generating an observation.
Type:
Content:
complex, 1 attribute, 10 elements
Subst.Gr:
may substitute for elements: gml:AbstractFeature, gml:AbstractGML, gml:AbstractObject; may be substituted with 1 element
Defined:
globally; see XML source
Used:
The class 'RangeBounds' describes the extreme limits of a property value range (also known as a property value interval).
Type:
Content:
complex, 2 elements
Subst.Gr:
may substitute for element gml:AbstractObject
Defined:
globally; see XML source
Used:
The attribute 'rangeEnd' provides the extreme upper limit of the range or interval.
Type:
double
Content:
simple
Defined:
locally within metce:RangeBoundsType complexType; see XML source
The attribute 'rangeStart' provides the extreme lower limit of the range or interval.
Type:
double
Content:
simple
Defined:
locally within metce:RangeBoundsType complexType; see XML source
The attribute 'resolutionScale' specifies the smallest change (e.g. the 'resolution' [1]) in property value of the 'measurand' that is intended to be measured within this procedure, using the unit of measure 'uom'.
Type:
integer
Content:
simple
Defined:
The attribute 'uom' specifies the unit of measure that the values of 'resolution' and 'measuring interval' are specified in.
Type:
Content:
empty, 1 attribute
Defined:
Complex Type Summary
Content:
complex, 10 attributes, 1 element
Defined:
globally; see XML source
Includes:
definition of 1 element
Used:
Content:
complex, 1 attribute, 9 elements
Defined:
globally; see XML source
Includes:
definitions of 4 elements
Used:
Content:
complex, 10 attributes, 1 element
Defined:
globally; see XML source
Includes:
definition of 1 element
Used:
never
Content:
complex, 1 attribute, 10 elements
Defined:
globally; see XML source
Includes:
definitions of 3 elements
Used:
Content:
complex, 1 attribute, 1 element
Defined:
globally; see XML source
Includes:
definition of 1 element
Used:
Content:
complex, 2 elements
Defined:
globally; see XML source
Includes:
definitions of 2 elements
Used:
XML Source
<?xml version="1.0" encoding="UTF-8"?>
<schema attributeFormDefault="unqualified" elementFormDefault="qualified" targetNamespace="http://def.wmo.int/metce/2013" version="1.0" xmlns="http://www.w3.org/2001/XMLSchema" xmlns:gml="http://www.opengis.net/gml/3.2" xmlns:metce="http://def.wmo.int/metce/2013" xmlns:om="http://www.opengis.net/om/2.0" xmlns:opm="http://def.wmo.int/opm/2013">
<annotation>
<documentation>
References to WMO and ICAO Technical Regulations within this XML schema shall have
no formal status and are for information purposes only. Where there are differences
between the Technical Regulations and the schema, the Technical Regulations shall
take precedence. Technical Regulations may impose requirements that are not described
in this schema.
</documentation>
<documentation>
The 'Procedure' package provides a concrete implementation of the abstract OM_Process
class (from ISO 19156). The implementation is intended to support the following requirements:
1) reference to supporting documentation (attribute "documentationRef"); e.g. online
documentation describing the procedure in detail; 2) specification of parameters that
remain fixed within a particular configuration of the procedure (Configuration); a
soft-typed approach is used here following the pattern adopted for OM_Observation/parameter;
3) specification of the resolution [1] with which each observed physical phenomenon
is measured; and 4) specification of the measuring interval [2] of the instrument
or sensor for each observed physical phenomenon. [1] Resolution: smallest change
in a quantity being measured that causes a perceptible change in the corresponding
indication (from the 'International vocabulary of metrology' [http://www.bipm.org/utils/common/documents/jcgm/JCGM_200_2008.pdf])
[2] Measuring interval: set of values of quantities of the same kind that can be measured
by a given measuring instrument or measuring system with specified instrumental uncertainty,
under defined conditions (from the 'International vocabulary of metrology' [http://www.bipm.org/utils/common/documents/jcgm/JCGM_200_2008.pdf])
</documentation>
<appinfo>
<sch:title xmlns:sch="http://purl.oclc.org/dsdl/schematron">
Schematron validation
</sch:title>
<sch:ns prefix="metce" uri="http://def.wmo.int/metce/2013" xmlns:sch="http://purl.oclc.org/dsdl/schematron"/>
<sch:ns prefix="sam" uri="http://www.opengis.net/sampling/2.0" xmlns:sch="http://purl.oclc.org/dsdl/schematron"/>
<sch:ns prefix="sams" uri="http://www.opengis.net/samplingSpatial/2.0" xmlns:sch="http://purl.oclc.org/dsdl/schematron"/>
<sch:ns prefix="xlink" uri="http://www.w3.org/1999/xlink" xmlns:sch="http://purl.oclc.org/dsdl/schematron"/>
<sch:ns prefix="om" uri="http://www.opengis.net/om/2.0" xmlns:sch="http://purl.oclc.org/dsdl/schematron"/>
<sch:ns prefix="gml" uri="http://www.opengis.net/gml/3.2" xmlns:sch="http://purl.oclc.org/dsdl/schematron"/>
</appinfo>
</annotation>
<include schemaLocation="metce.xsd"/>
<element name="Process" substitutionGroup="gml:AbstractFeature" type="metce:ProcessType">
<annotation>
<documentation>
Class 'OM_Process' (related to OM_Observation via the 'Procedure' Association) is
used to define the process(es) involved in generating an observation. An instance
of OM_Process is often an instrument or sensor (perhaps even a sensor in a given calibrated
state), but it may be a human observer executing a set of instructions, a simulator
or process algorithm. The 'Procedure' should provide sufficient information to interpret
the result of an observation; thus if a sensor is recalibrated or its height above
local ground is changed, a new instance of OM_Process should be created and associated
with subsequent observations from that sensor (at least until the sensor is changed
again). Predominantly we expect the Process instance to be externally published /
defined and 'static' (e.g. perhaps changing less often than once per month due to
amendments to operational protocols etc.). The class 'Process' provides a concrete
implementation of OM_Process (from ISO 19156). The implementation is intended to
support the following requirements: 1) reference to supporting documentation (documentationRef);
e.g. online documentation describing the procedure in detail; 2) specification of
parameters that remain fixed within a particular configuration of the procedure (Configuration);
a soft-typed approach is used here following the pattern adopted for OM_Observation/parameter;
3) specification of the resolution [1] with which each observed physical phenomenon
is measured; and 4) specification of the measuring interval [2] of the instrument
or sensor for each observed physical phenomenon. [1] Resolution: smallest change
in a quantity being measured that causes a perceptible change in the corresponding
indication (from the 'International vocabulary of metrology' [http://www.bipm.org/utils/common/documents/jcgm/JCGM_200_2008.pdf])
[2] Measuring interval: set of values of quantities of the same kind that can be measured
by a given measuring instrument or measuring system with specified instrumental uncertainty,
under defined conditions (from the 'International vocabulary of metrology' [http://www.bipm.org/utils/common/documents/jcgm/JCGM_200_2008.pdf])
</documentation>
</annotation>
</element>
<complexType name="ProcessType">
<complexContent>
<extension base="gml:AbstractFeatureType">
<sequence>
<element maxOccurs="1" minOccurs="0" name="documentationRef" type="gml:ReferenceType">
<annotation>
<documentation>
Reference to an external process definition providing information about relevant documentation
that describes the associated Process.
</documentation>
</annotation>
</element>
<element maxOccurs="unbounded" minOccurs="0" name="parameter" type="om:NamedValuePropertyType">
<annotation>
<documentation>
The association role 'parameter' references an instance of NamedValue that specifies
parameters associated with a particular configuration of the procedure (Configuration)
</documentation>
</annotation>
</element>
<element maxOccurs="unbounded" minOccurs="0" name="context" type="metce:MeasurementContextPropertyType">
<annotation>
<documentation>
The association role 'context' references an instance of MeasurementContext class
that defines resolution and measuring interval for a specific measurand.
</documentation>
</annotation>
</element>
</sequence>
</extension>
</complexContent>
</complexType>
<complexType name="ProcessPropertyType">
<sequence minOccurs="0">
<element ref="metce:Process"/>
</sequence>
<attributeGroup ref="gml:AssociationAttributeGroup"/>
<attributeGroup ref="gml:OwnershipAttributeGroup"/>
</complexType>
<element name="MeasurementContext" substitutionGroup="gml:AbstractGML" type="metce:MeasurementContextType">
<annotation>
<documentation>
Instances of the class 'MeasurementContext' specify the resolution [1] and measuring
interval [2] for a given physical property in the context of this measurement procedure.
[1] Resolution: smallest change in a quantity being measured that causes a perceptible
change in the corresponding indication (from the 'International vocabulary of metrology'
[http://www.bipm.org/utils/common/documents/jcgm/JCGM_200_2008.pdf]) [2] Measuring
interval: set of values of quantities of the same kind that can be measured by a given
measuring instrument or measuring system with specified instrumental uncertainty,
under defined conditions (from the 'International vocabulary of metrology' [http://www.bipm.org/utils/common/documents/jcgm/JCGM_200_2008.pdf])
</documentation>
<appinfo>
<sch:pattern id="MeasurementContext1" xmlns:sch="http://purl.oclc.org/dsdl/schematron">
<sch:rule context="//metce:MeasurementContext">
<sch:assert test="((: TO BE IMPLEMENTATED WHEN REPOSITORY IS READY :) true())">
MeasurementContext: unitOfMeasure shall be appropriate for measurand
</sch:assert>
</sch:rule>
</sch:pattern>
<sch:pattern id="MeasurementContext2" xmlns:sch="http://purl.oclc.org/dsdl/schematron">
<sch:rule context="//metce:MeasurementContext">
<sch:assert test="(if( exists(metce:measuringInterval) or exists(metce:resolutionScale) ) then ( exists(metce:unitOfMeasure) ) else( true() ))">
MeasurementContext: if measuringInterval or resolutionScale or both are given then
uom must also be provided
</sch:assert>
</sch:rule>
</sch:pattern>
</appinfo>
</annotation>
</element>
<complexType name="MeasurementContextType">
<complexContent>
<extension base="gml:AbstractGMLType">
<sequence>
<element maxOccurs="1" minOccurs="0" name="unitOfMeasure" type="gml:UnitOfMeasureType">
<annotation>
<documentation>
The attribute 'uom' specifies the unit of measure that the values of 'resolution'
and 'measuring interval' are specified in. Typically, this will also be the unit
of measure used to specify the measured quantity values. Unless otherwise specified,
this unit of measure can be assumed to be the default unit of measure for this measurand.
</documentation>
</annotation>
</element>
<annotation>
<documentation>
The attribute 'measurand' [1] specifies the physical property that the associated
'resolution' and 'measuring interval' apply to. The measurand may be sourced from
an external controlled vocabulary, thesaurus or ontology or defined locally. The
measurand may reference a qualified observable property if required. If the measurand
references an observable physical property that serves as the base property for a
qualified observable property, the measurement context is assumed to apply to ALL
the qualified observable properties that reference this base property unless otherwise
stated. For example, observable physical property 'radiance' may be qualified to measure
wavelength bands 50-100nm, 100-200nm, 200-500nm etc. A measurement context associated
with 'radiance' would be inferred to apply to all of these qualified radiance properties.
[1] Measurand: quantity intended to be measured (from the 'International vocabulary
of metrology' [http://www.bipm.org/utils/common/documents/jcgm/JCGM_200_2008.pdf]
</documentation>
</annotation>
</element>
<element maxOccurs="1" minOccurs="0" name="measuringInterval" type="metce:RangeBoundsPropertyType">
<annotation>
<documentation>
The attribute 'measuringInterval' [1] specifies the extreme lower and upper limits
of property values of the 'measurand' that can measured within this procedure, using
the unit of measure 'uom'. [1] Measuring interval: set of values of quantities of
the same kind that can be measured by a given measuring instrument or measuring system
with specified instrumental uncertainty, under defined conditions (from the 'International
vocabulary of metrology' [http://www.bipm.org/utils/common/documents/jcgm/JCGM_200_2008.pdf])
</documentation>
</annotation>
</element>
<element maxOccurs="1" minOccurs="0" name="resolutionScale" type="integer">
<annotation>
<documentation>
The attribute 'resolutionScale' specifies the smallest change (e.g. the 'resolution'
[1]) in property value of the 'measurand' that is intended to be measured within this
procedure, using the unit of measure 'uom'. This shall be provided as a scaling factor.
For example: &lt;ul&gt; &lt;li&gt;scale = -2 implies a precision of 100 units &lt;/li&gt; &lt;li&gt;scale
= -1 implies a precision of 10 units&lt;/li&gt; &lt;li&gt;scale = 0 implies a precision of 1
unit&lt;/li&gt; &lt;li&gt;scale = 1 implies a precision of 0.1 units&lt;/li&gt; &lt;li&gt;scale = 2 implies
a precision of 0.01 units &lt;/li&gt; &lt;/ul&gt; etc. [1] Resolution: smallest change in a quantity
being measured that causes a perceptible change in the corresponding indication (from
the 'International vocabulary of metrology' [http://www.bipm.org/utils/common/documents/jcgm/JCGM_200_2008.pdf])
</documentation>
</annotation>
</element>
</sequence>
</extension>
</complexContent>
</complexType>
<complexType name="MeasurementContextPropertyType">
<sequence minOccurs="0">
<element ref="metce:MeasurementContext"/>
</sequence>
<attributeGroup ref="gml:AssociationAttributeGroup"/>
<attributeGroup ref="gml:OwnershipAttributeGroup"/>
</complexType>
<element name="RangeBounds" substitutionGroup="gml:AbstractObject" type="metce:RangeBoundsType">
<annotation>
<documentation>
The class 'RangeBounds' describes the extreme limits of a property value range (also
known as a property value interval).
</documentation>
<appinfo>
<sch:pattern id="RangeBounds1" xmlns:sch="http://purl.oclc.org/dsdl/schematron">
<sch:rule context="//metce:RangeBounds">
<sch:assert test="(number( metce:rangeStart/text() ) lt number( metce:rangeEnd/text() ))">
RangeBounds: The extreme lower limit of the range of interval must be less than the
extreme upper limit.
</sch:assert>
</sch:rule>
</sch:pattern>
</appinfo>
</annotation>
</element>
<complexType name="RangeBoundsType">
<sequence>
<element name="rangeStart" type="double">
<annotation>
<documentation>
The attribute 'rangeStart' provides the extreme lower limit of the range or interval.
</documentation>
</annotation>
</element>
<element name="rangeEnd" type="double">
<annotation>
<documentation>
The attribute 'rangeEnd' provides the extreme upper limit of the range or interval.
</documentation>
</annotation>
</element>
</sequence>
</complexType>
<complexType name="RangeBoundsPropertyType">
<sequence>
<element ref="metce:RangeBounds"/>
</sequence>
<attributeGroup ref="gml:OwnershipAttributeGroup"/>
</complexType>
</schema>

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